Abstract
This work focuses on using the photoexpansion effect to fabricate surface-grating structures and studying the applicability in photonic circuitry. Surface gratings with periods ranging from 2.95 μm to 0.377 μm were written holographically using 514.5-nm light from an Argon ion laser. Gratings with 2.95-μm period were also written for different exposure times to study the dose effect on surface-relief structures. AFM images of the irradiated surfaces were obtained. A He-Ne laser operating at 632.8 nm enabled to measure diffraction efficiencies.
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